ECE Seminar: Engineering material properties using block copolymer self assembly
Friday, April 10, 2015
12:00 pm - 1:00 pm
Hudson Hall 208
Dr. Charles Black, Center for Functional Nanomaterials, Brookhaven National Laboratory
Block copolymer thin films provide a robust method for generating regular, uniform patterns at length scales in the range of ten nanometers, over arbitrarily large areas. A significant advantage of such block copolymer-based patterning is its ease of integration with all other aspects of traditional thin-film processing, including plasma-based etching and metallization. Because of the dearth of other high resolution, high-throughput patterning options, block copolymers are under intense scrutiny by the information technology industry for lithography enhancement ¿ an application with extreme demands on pattern uniformity. However, such process compatibility ensures a host of other application opportunities in designing material properties through control of the internal nanostructure. For example, I will describe our recent use of block copolymer self assembly in engineering broadband omnidirectional anti-reflecting surfaces for solar devices. Precisely controlling surface texture through block copolymer-based patterning can also render a material superhydrophobic, and able to remain water-repellent during droplet impacts at speeds in excess of 10 meters per second. The Center for Functional Nanomaterials (CFN) at Brookhaven National Laboratory is a science-based user facility funded by the U.S. Department of Energy, devoted to nanotechnology research addressing challenges in energy security.